Physical Vapor Deposition Plasma

Physical Vapor Deposition Radio Frequency Sputtering System with Plasma

Physical Vapor Deposition Radio Frequency Sputtering System with Blue Plasma [Photo: Stefan Wagener, Uni Siegen]
Physical Vapor Deposition Radio Frequency Sputtering System with Blue Plasma [Photo: Stefan Wagener/Chair of Surface and Materials Technology, Uni Siegen]
Physical Vapor Deposition Radio Frequency Sputtering System with Red Plasma [Photo: Stefan Wagener, Uni Siegen]
Physical Vapor Deposition Radio Frequency Sputtering System with Red Plasma [Photo: Stefan Wagener/Chair of Surface and Materials Technology, Uni Siegen]

Plasma creation inside a Physical Vapor Deposition (PVD) chamber.

In this case, a PVD-Coating System is being used to create a titanium nitride coating using radio frequency sputtering

Inside the PVD RF Sputtering System, blue plasma is created through the deposition of titanium with nitrogen gas, red plasma is created through the deposition of Titanium with a mixture of nitrogen gas and argon gas.

Images © Stefan Wagener, courtesy of Prof Xin Jiang, Chair of Surface and Materials Technology

Contact

Prof Dr Xin Jiang
Chair of Surface and Materials Technology